Enhancing Yield by Minimizing Contamination: ALD Coatings for Critical Chamber Components
March 15, 2021
With each transition to a new technology node, fab requirements for metal and particle contamination become more stringent, posing challenges for existing coating methods such as anodization or plasma spray that may not provide complete protection...
Industrial Atomic Layer Deposition for Image Sensors and Light Sources
September 6, 2019
SEMI spoke with Dr. Mikko Söderlund, sales director for Beneq’s semiconductor business, about trends in Atomic Layer Deposition (ALD) applications. Söderlund shared his views ahead of his presentation at SEMI MEMS & Imaging Sensors Summit, 25-27...