Meeting Metrology and Inspection Requirements as EUVL Ramps Up for 5nm and 3nm
The Advanced Lithography TechXPOT at this year’s SEMICON West will explore progress in extreme ultraviolet lithography (EUVL), its economic viability for high-volume manufacturing (HVM) and other lithography solutions that will address the march to...
SEMICON West Preview: Materials and Subsystem Suppliers Find Solutions to Emerging Wafer Defectivity Issues at Small Geometries
New metrology and inspection technologies and new analysis approaches made possible by improving compute technology offer solutions to finding the increasingly subtle variations in materials and subsystems that meet specifications but still cause...
Microelectronics Sector Extends AI from Pattern Recognition to Prediction and Control
What’s next for smarter, more connected electronics manufacturing - Part 3
Process Complexity Means Exponentially Increasing Data Volumes and Analysis Challenges
What’s next for smarter, more connected electronics manufacturing - Part 2
Metrology and Inspection Challenges at 5nm and Beyond
The Scaling Technologies TechXPOT at this year’s SEMICON West (Scaling Every Which Way! – Thursday, July 12, 2:00pm-4:00pm) will explore traditional scaling as the industry marches toward 3nm and beyond, as well as technologies that enable 3D...
EUV Lithography: Extending the Patterning Roadmap to 3nm
This year’s Advanced Lithography TechXPOT at SEMICON West will explore the progress on extreme ultra-violet lithography (EUVL) and its economic viability for high-volume manufacturing (HVM), as well as other lithography solutions that can address...